离子束辅助脉冲激光沉积硼碳氮薄膜

以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮（BCN）薄膜.用X光电子谱和傅立叶变换红外谱方法表征了制备的薄膜.结果表明,膜层中包含B-C、N-C、B-N键等复合结构,以B-C-N原子杂化的形式结合成键,而并非各种成分的简单混合.还探讨了成膜过程和相关机理,离子束中的活性氮有效地和脉冲激光对B4C靶烧蚀产生的硼和碳结合成键,氮离子束的辅助还能在一定程度上抑制氧杂质进入膜层,给衬底适当加温有利于提高氮的含量并影响薄膜的化学结构.

Preparation of BCN thin films by ion beam assisted pulsed laser deposition

Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. The synthesized films were characterized by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It is found that the synthesized films contain several bonding structures including B-C,N-C,B-N with B-C-N atomic hybridization rather than a simple mixture. The processes involved in and mechanisms responsible for the film preparation were also discussed. The activated nitrogen in the ion beam can be efficiently combined with boron and carbon created from pulsed laser ablation of the B4C target, resulting in the deposition of BCN film. The assistance of the ion beam also reduces oxygen from being incorporated into the film as impurities. Elevated substrate temperature is beneficial to the incorporation of nitrogen in the film and influences the chemical structure of the film as well.