STEPPER通用测试掩模的设计及使用 |
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作者单位: | The 45th Institute,Ministry of EI,Pingliang,Gansu,744000 |
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摘 要: | 介绍了一种STEPPER通用测试掩模(UTM)的设计构成及各测试元素图形的作用。在此基础上,分析了电子束制作UTM的误差,并阐述了UTM的测试方法、数据处理及其对STEPPER性能的影响。
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关 键 词: | 测试,掩模 |
Design and Usage of STEPPER Universal Test Mask |
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Authors: | Liu Wenhui |
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Abstract: | The paper presents the design of a kind of STEPPER universal test mask(UTM)and the functions of individual testelement pattern. The errors of UTM made by electron beam are analysed. The measurement and test data processing of UTM, and the influence on STEPPER features are discussed. |
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Keywords: | Test Mask |
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