Preparation and performance of broadband antireflective sub-wavelength structures on Ge substrate |
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Authors: | Xiang-wei Shen Zheng-tang Liu Yang-ping Li Hong-cheng Lu qi-yuan Xu and Wen-ting Liu |
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Affiliation: | (1) State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi’an, 710072, China |
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Abstract: | Sub-wavelength structures (SWS) were prepared on Ge substrates through photolithography and reactive ion etching (RIE) technology
for broadband antireflective purposes in the long wave infrared (LWIR) waveband of 8–12 μm. Topography of the etched patterns
was observed using high resolution optical microscope and atomic force microscope (AFM). Infrared transmission performance
of the SWS was investigated by Fourier transform infrared (FTIR) spectrometer. Results show that the etched patterns were
of high uniformity and fidelity, the SWS exhibited a good broadband antireflective performance with the increment of the average
transmittance which is over 8–12 μm up to 8%.
This work has been supported by the basic research foundation of Northwestern polytechnical University |
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