首页 | 本学科首页   官方微博 | 高级检索  
     


Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
Authors:Tarala  V. A.  Altakhov  A. S.  Ambartsumov  M. G.  Martens  V. Ya.
Affiliation:1.North Caucasus Federal University, Stavropol, 355009, Russia
;
Abstract:Technical Physics Letters - The possibility of growing oriented AlN films on Al2O3 substrates at temperatures below 300°C by plasma-enhanced atomic layer deposition was examined. The samples...
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号