氧化钨薄膜电致变色状态下物相组份及表面形貌变化的研究

通过对直流磁控溅射方法得到ＷＯｘ膜层的电化学和光学性能测试，以及ＸＰＤ和ＳＴＭ的物相，形貌分析，发现该ＷＯｘ膜层具有良好的电致变色性能，原始沉积态ＷＯｘ膜层为非晶态，其着退色状态仍在非晶特性，而晶ＷＯｘ膜层在着色态和退色态之间发生物相组份的可逆变化，且表面形貌有很大差异。

STUDY ON THE PHASE,COMPOSITION AND SURFACE MORPHOLOGY CHANGES OF WO x FILM IN ELECTROCHROMIC STATES

WO x electrochromic (EC) films obtained by DC magnetron sputtering technique were investigated by XRD and STM measurements.The reversible phases changes of c WO x film between the bleached and colored states are revealed.The study results indicate that the amorphous as deposited WO x film(a WO x)is of amorphous microstructure both in the bleached and colored states.However,the crystal WO x(c WO x) is stoichiometric triclinic lattice WO 3 in bleached state,and would change into nonstoichiometry tetragonal lattice H 0.33 WO 3 in colored state.The surface morphology of colored c H 0.33 WO 3 film is very different from that of the bleached WO 3 film.