Synthesis of high-density MgO films by a novel magnetron sputtering system

A novel magnetron sputtering system, which included simply designed two grids between target and substrate, was developed in our laboratory for the synthesis of high-density MgO films. In order to investigate the effect of grids assisted magnetron sputtering, MgO films were deposited by conventional magnetron, one grid assisted magnetron and two grids assisted magnetron. The saturated ion current density and Mg ion fraction in MgO discharges generated by grids assisted magnetron were increased in comparison with those obtained in conventional magnetron, which means that grids assisted magnetron led to the enhancement of plasma density. As a result of microstructure analysis, grids assisted magnetron produced a higher density MgO film with smoother surface compared to that obtained in conventional magnetron.