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Magnetoresistance and microstructure evolution upon rapid thermal annealing of giant magnetoresistive Co/Cu/Co/CoNbZr multilayers
Authors:Qi-Ye Wen  Huai-Wu Zhang  Xiang-Dong Jiang  Xiao-Li Tang  Wang-Li Zhang
Affiliation:School of Microelectronic and Solid-state Electronic, University of Electronic Science and Technology of China, Chengdu 610054, PR China
Abstract:The magnetoresistance (MR) variation of Co/Cu/Co/CoNbZr spin valves as a result of rapid thermal annealing has been investigated. MR ratio of 3.8% was obtained in the as-deposited sample and a considerable increase to 6.86% was observed in the 450°C×60 s treated sample. Microstructure studies show that the enhancement of MR ratio is a consequence of the nano-crystallization of amorphous CoNbZr soft layer. The nano-crystallized CoNbZr possess fine and dense microstructure and excellent electrical and soft magnetic properties which leads to the MR enhancement. With increasing annealing temperature or annealing time, interface roughness caused by rapid grain growth decrease the MR ratio rapidly. XRD studies imply that the interfusion of Cu atom into the Co layer is another possible degradation mechanism of Co/Cu/Co/CoNbZr spin valves at annealing temperature beyond 550°C.
Keywords:Giant magnetoresistance   Rapid thermal annealing   Amorphous CoNbZr alloy   Nano-crystallization
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