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Characterization of sputtered SmCo thin films for light element contamination using RBS and HIERDA techniques
Authors:James Y Wang  Dinesh K Sood  Nick Dytlewski
Affiliation:
  • a School of Biophysical Sciences and Electrical Engineering, Swinburne University of Technology, Hawthorn, VIC, Australia
  • b School of Electrical and Computer Engineering, RMIT University, Melbourne, VIC, Australia
  • c Department of Mechanical and Aeronautical Engineering, Western Michigan University, 1903 West Michigan Avenue, Kalamazoo, MI 49024, USA
  • d ANSTO, Physics Division, Menai, NSW, Australia
  • Abstract:Samarium cobalt films were prepared on silicon substrates with and without a chromium buffer layer at room temperature and 600°C using direct current unbalanced magnetron sputtering. For obtaining ideal magnetic properties, the films should be free from impurities, such as O, Al and others. Rutherford backscattering spectrometry and heavy ion elastic recoil detection analysis were used to determine the composition and film thickness and to monitor the light element contamination across film thickness. X-ray diffractometer and superconducting quantum interference device were employed to characterize the structure and magnetic properties of the films, respectively. The results obtained led to an improved design of the ground shield and the use of a sorption pump to effectively minimize aluminium and oxygen concentration in the films, respectively.
    Keywords:Thin film  SmCo  Magnetron sputtering  Magnetic properties
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