| TiO2薄膜材料的制备及其性能的研究进展 |
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| 引用本文： | 张自升,张艳玲,黄世涛. TiO2薄膜材料的制备及其性能的研究进展[J]. 广州化工, 2010, 38(11): 28-30 |
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| 作者姓名： | 张自升 张艳玲 黄世涛 |
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| 作者单位： | 南京航空航天大学理学院,江苏,南京,210016;南京航空航天大学理学院,江苏,南京,210016;南京航空航天大学理学院,江苏,南京,210016 |
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| 摘 要： | TiO2是一种宽带隙半导体材料,具有广阔的应用前景。综述了TiO2薄膜材料的制备方法及其气敏、光电、光催化性能,并对TiO2薄膜材料的发展趋势进行了展望。
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| 关 键 词： | TiO2薄膜 掺杂 制备方法 性能研究 |
Research Progress of Preparation and Properties of TiO2 Thin Films |
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| ZHANG Zi-sheng,ZHANG Yan-ling,HUANG Shi-tao. Research Progress of Preparation and Properties of TiO2 Thin Films[J]. GuangZhou Chemical Industry and Technology, 2010, 38(11): 28-30 |
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| Authors: | ZHANG Zi-sheng ZHANG Yan-ling HUANG Shi-tao |
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| Affiliation: | (College of Science,Nanjing University of Aeronautics and Astronautics,Jiangsu Nanjing 210016,China) |
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| Abstract: | TiO2 was a broadband gap semiconductor material and had wild application prospects.Preparation method of TiO2 thin films and gas sensing,photoelectric,photocatalytic properties of TiO2 thin film were reviewed and the development trend of TiO2 thin films materials was prospected |
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| Keywords: | TiO2 thin films doping preparation methods properties research |
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