| 磁控溅射MoS2薄膜的结构和微观摩擦磨损特性 |
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| 引用本文： | 王吉会,张化一.磁控溅射MoS2薄膜的结构和微观摩擦磨损特性[J].润滑与密封,1999(2):25-27. |
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| 作者姓名： | 王吉会 张化一 |
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| 作者单位： | 清华大学摩擦学国家重点实验室!北京100084 |
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| 基金项目： | 国家自然科学基金 No.59575032，清华大学磨擦学重点实验室开放基金，校青年基金，中国博士后基金，国防科工委微机理研究专项青年基金资助项目 |
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| 摘 要： | 利用磁控溅射法制取了ＭｏＳ２薄膜，通过Ｘ光电子能谱、Ｘ射线衍射和ＡＦＭ／ＦＦＭ方法对薄膜的表面形貌、成分、化学价态、结构和微观摩擦磨损性能进行了研究。实验结果表明：ＭｏＳ２薄膜表面呈蠕虫状，微观结构为（１００）面平行于基面的非晶态，表面膜由ＭｏＳ２和少量的ＭｏＯ３组成。在微观摩擦磨损过程中，ＭｏＳ２薄膜的摩擦系数较大，且而磨性能高；微摩擦过程中没有磨合阶段，不存在摩擦机理的转变。
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| 关 键 词： | 二硫化钼薄膜 结构 微观摩擦学 磁控溅射 润滑剂 |
Structure and Microtribological Characters of Magnetron Sputtering MoS_2 Thin Film |
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| Wang Jihui Zhang Huayi Lu Xinchun Wen Shizhu.Structure and Microtribological Characters of Magnetron Sputtering MoS_2 Thin Film[J].Lubrication Engineering,1999(2):25-27. |
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| Authors: | Wang Jihui Zhang Huayi Lu Xinchun Wen Shizhu |
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| Abstract: | MoS2 thin film was deposited by magnetron sputtering methods on the surface of single crystalline silicon. The morphology, composition, bonding energy, structure and microtribological properties were studied by PHI - 5300, XRD and atomic force/friction force microscope. The results show that the characters of MoS2 morphology was acicular or worm - like island, (100) plane were found parallel to the substrate. The MoS2 thin film was composed of MoS2 and small amount of MoO3. The friction coefficient of MoS2 film in microtribological process was 0.11. There was no obvious worn track under the load below 130nN and 50 scanning cycles. In the microtribological process, the running - in period and transition of friction mechanism were not observed. |
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| Keywords: | MoS2 Thin Film Structure Microtribology AFM/FFM |
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