Matrices pattern using FIB; ‘Out‐of‐the‐box’ way of thinking

Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high‐resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an ‘out‐of‐the‐box’ method of writing using FIB, which enables creating very large matrices, up to the beam‐shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.