微波电子回旋共振等离子体技术及其应用

微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。由于这种等离子体电离水平高,化学活性好,可以用来实现基片上薄膜的室温化学气相淀积和反应离子刻蚀,因此对于微电子学、光电子学和薄膜传感器件的发展,这种等离子体会具有重要的意义。此外,采用微波电子回旋共振等离子体原理,没有灯丝的离子源可以提高离子源的使用寿命,可以增加离子束的束流密度。可以确信,微波电子回旋共振等离子体的发展,将把离子源技术提高到一个新的水平。显然,这必将对材料表面改性工艺,包括离子注入掺杂等工艺的发展发挥作用。自从1985年以来,为了得到大容积等离子体而发展了微波电子回旋共振多磁极等离子体,这些技术在薄膜技术、微细加工以及材料表面改性中的应用前景是乐观的。我们将在本文中,介绍微波电子回旋共振等离子体的原理及其应用。

THE TECHNOLOGY AND APPLICATIONS OF MICROWAVE ECR PLASMA

The microwave electron cyclotron resonance (ECR) plasma is one of the most important means for depositing thin films and microfabrications as well as surface modifications of materials. Due to its high ionization level and good chemical activity, it may used to realize the chemical vapor deposition of thin films on the substrates under the room temperature and the reaction ion etching. Therefore, it has important significance in developing of the microelectronics, opto-electronics and film sensor devices. In addition, using the principle of microwave ECR, the ion source without filament may improve the service life of source and increase the beam current density of the ion beam. It may be sure that the technology of ion source will be put to a new level by the development of the microwave ECR plasma. Obviously, it must play a role in progress of surface modification technology of materials, including material impurity by ion implantation. Since 1985, the multimagent plasma of microwave ECR has been developed for getting the plasma with large volume. The application prospects of these technologies are optimistic in film technology and surface modifications of materials. In this paper, we shall introduce the principle of the microwave ECR plasama and its applications.