Measurement of Ion Parameters by Ion Sensitive Probe in ECR Plasma |
| |
Authors: | TAN Bisong MA Zhibin SHEN Wulin WU Zhenhui CAO Hong WANG Jianhua |
| |
Abstract: | Ion parameters in electron cyclotron resonance (ECR) microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak (42.3?1010cm-3) at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W. The plasma far away from the resonant point is found to be radially uniform. |
| |
Keywords: | ion sensitive probe double Langmuir probe ECR plasma ion parameter spatial distribution |
|
| 点击此处可从《等离子体科学和技术》浏览原始摘要信息 |
|
点击此处可从《等离子体科学和技术》下载全文 |