首页 | 本学科首页   官方微博 | 高级检索  
     


Computer simulation study of the atomistic mechanism of deformation and fracture initiation in thin fcc metal films
Authors:Y. Shimomura   M. Kiritani  I. Mukouda
Affiliation:

a Faculty of Engineering, Hiroshima Institute of Technology, Miyake 2-1-1, Saeki-ku, Hiroshima 731-5193, Japan

b Academic Frontier Research Centre for Ultra-High-Speed Plastic Deformation, Hiroshima Institute of Technology, Hiroshima 731-5193, Japan

c Faculty of Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, Japan

Abstract:A molecular dynamics computer simulation was performed using a potential of embedded atom method (EAM) of copper so as to study the atomistic mechanism of plastic deformation in thin metal films. When a thin film of Cu crystal is elongated by more than 8%, small islands of surplus atoms start to nucleate between (111) planes. The formation of new (111) islands occurs by the movement of atoms along the 111 direction from two successive (111) planes. Multiplication of these (111) planes serves as the mechanism of elongation, releasing the accumulated elastic stress. Vacancies and small clusters, thereof, are left behind at the positions from which atoms have migrated and also at the part of newly nucleated (111) planes in which atoms were not filled completely. Stacking fault tetrahedra (sft) are nucleated directly in the deformed region as a result of movement of atoms along 111 on the tetrahedral (111) cap.
Keywords:Computer simulation   Copper   Thin film elongation   Vacancy generation   Crack initiation   Stacking fault tetrahedral
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号