Evaluation of PZT thin films on Ag coated Si substrates |
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Authors: | Hong-Xue Zhang Pentti Karjalainen Antti Uusimäki Seppo Leppävuori |
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Affiliation: | (1) Materials Engineering Laboratory, University of Oulu, FIN-90570 Oulu, Finland;(2) Microelectronics and Material Physics Laboratory, University of Oulu, FIN-90570 Oulu, Finland |
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Abstract: | Fabrication characteristics of hybrid thin film components are investigated. Lead zirconate titanate (PZT) films, thickness
10 μm, are fabricated by using laser ablation on the Ag electrode (about 1 μm thick) which is deposited on 200 μm Si substrates
by evaporation. Composition close to the target material is obtained in PZT films even in air and without substrate heating.
Low surface energy in the Ag−Si system causes spheroidization of the Ag layer on the fresh Si substrate, but the surface can
be modified by grinding and oxidization. Only some cavities exist at the interface. The interface between the Ag electrode
and PZT layer is physically continuous, as revealed by electron microscopy. After annealing at 750°C for 2 h, the PZT layer
consists of the rhombohedral perovskite phase with a fraction of the pyrochlore phase. Detrimental interdiffusion between
Pb and Si occurs during annealing if the PZT thin film is directly on the Si substrate. This is retarded by the presence of
the Ag layer. |
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Keywords: | Ag coated Si substrates laser ablation PZT piezoelectric films |
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