A new technique for measuring sputtering yields at high energies

The use of thin, self-supporting carbon catcher foils allows one to measure sputtering yields in a broad range of materials with high sensitivity. Analyzing the foils with Rutherford forward scattering, we have measured sputtered A1, Si and P surface densities down to 5 × $\text{10}{}^{13}\text{cm}{}^2$ with uncertainties of about 20%.