| 离子枪与离子镀膜 |
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| 引用本文： | 凌世德,程维明. 离子枪与离子镀膜[J]. 光学仪器, 1986, 0(2) |
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| 作者姓名： | 凌世德 程维明 |
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| 作者单位： | 上海机械学院仪器仪表分院，上海机械学院仪器仪表分院 |
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| 摘 要： | 离子镀膜技术的发展与离子枪的研制密切相关,由于应用场合的不同,出现了多种形式的离子枪。本文对各种枪进行了综述和分类,並对各类枪的结构特点、性能、适用范围以及在离子镀膜技术中的应用进行了讨论。文中特别对于考夫曼枪和磁控溅射轮作了较为详细的介绍、分析,并给出了一些基本曲线。
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Ion Gun and Ionic Deposting |
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| Abstract: | The development of ionic depositing technology has a direct bearing on the research of the ion gun which possesses mang types in different applications。Various Kinds of guns are reviewed and classified, whose structual characteristics, properties and applications in ionic deposition are discussed in the paper, especially, Ka fman gun and sputter magnetron gun are described and analyzed in detail and their basic curves are given. |
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