| Offner补偿器的结构设计与装调 |
| |
| 引用本文： | 陈旭,刘伟奇,康玉思,冯睿,魏仲伦,柳华,苗二龙.Offner补偿器的结构设计与装调[J].光学精密工程,2010,18(1). |
| |
| 作者姓名： | 陈旭 刘伟奇 康玉思 冯睿 魏仲伦 柳华 苗二龙 |
| |
| 作者单位： | 1. 中国科学院,长春光学精密机械与物理研究所,应用光学国家重点实验室,吉林,长春,130033;中国科学院,研究生院,北京,100039
2. 中国科学院,长春光学精密机械与物理研究所,应用光学国家重点实验室,吉林,长春,130033 |
| |
| 基金项目： | 十一五重大科技专项基金资助项目 |
| |
| 摘 要： | 针对90nm节点光刻投影镜头中使用的非球面存在高次项,且与理想球面偏离量较大的特点,基于像差补偿理论,设计了一种三片式结构的Offner补偿器来实现非球面的高精度检测。采用等量轴向球差补偿非球面各阶系数的方法,主动引入一定量的轴向球差,补偿光线在非球面法线方向的偏离量。结果表明,初级像差和高级像差可很好地平衡,使剩余像差很小;MTF远远超过衍射极限;系统工作波长为632.8nm,F数为1.64,均方波差RMSλ/1250;系统轴向像差0.47μm,满足基本干涉成像条件;各方面指标均满足高精度检测补偿器的设计要求。最后,根据现有检测装置的精度对所设计的结果进行了公差分析,给出了较宽松的公差容限。公差分配后,系统综合残余波像差0.00727λ,满足系统装调精度要求。
|
| 关 键 词： | 非球面检测 Offner补偿器 公差分配 |
Design and tolerance analysis of Offner compensator |
| |
| CHEN Xu,LIU Wei-qi,KANG Yu-si,FENG Rui,WEI Zhong-lun,LIU Hua,MIAO Er-long.Design and tolerance analysis of Offner compensator[J].Optics and Precision Engineering,2010,18(1). |
| |
| Authors: | CHEN Xu LIU Wei-qi KANG Yu-si FENG Rui WEI Zhong-lun LIU Hua MIAO Er-long |
| |
| Affiliation: | 1.State Key Laboratory of Applied Optics;Changchun Institute of Optics;Fine Mechanics and Physics;Chinese Academy of Sciences;Changchun 130033;China;2.Graduate University of Chinese Academy of Sciences;Beijing 100039;China |
| |
| Abstract: | To test precisely the aspheric surface in a 90 nm nodal point lithography projecting lens,an Offner compensator with three pieces of lenses is presented based on the aberration theory.The equal quantity of spherical error is introduced to compensate all orders of aspheric coefficients and a certain quantity of axial spherical aberration is brought in to compensate the deviation of aspheric surface in a normal direction.The results indicate that primary and high order aberrations are balanced well,therefore ... |
| |
| Keywords: | aspheric surface null testing Offner compensator tolerance analysis |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
