Proposals for producing novel periodic structures on silicon by ion bombardment sputtering

It is proposed, and confirmed analytically, that if multiple ion fluxes are incident simultaneously, at different oblique polar angles but at the same Azimuthal angle, on to a target, then the individual ripple patterns generated by sputtering are superimposed to produce novel surface structures. It is also shown that multiple focused ion fluxes incident on to rotating targets can produce circular novel patterns.