首页 | 本学科首页   官方微博 | 高级检索  
     

玻璃基板上硅薄膜附着力的研究
引用本文:朱建强,姜英娜,宋晨路,韩高荣.玻璃基板上硅薄膜附着力的研究[J].玻璃,2005,32(2):3-4,21.
作者姓名:朱建强  姜英娜  宋晨路  韩高荣
作者单位:威海蓝星玻璃股份有限公司,威海市,264205;浙江大学无机非金属材料研究所,杭州市,310027
摘    要:采用APCVD工艺,以SiH4为原料在不同温度的玻璃基板上硅质薄膜的制备,采用划痕法测量薄膜与基板之间的附着力,研究了薄膜附着力随基板温度变化趋势.说明了吸附、扩散的增强以及沉积速率的增大等都会导致薄膜附着力的增加.

关 键 词:镀膜玻璃  硅薄膜附着力  划痕法
文章编号:1003-1987(2005)02-0003-03

INVESTIGATION ON ADHESIVE POWER OF SILICON FILM TO GLASS SUBSTRATE
ZHU Jian-qiang,Jiang Ying-na,Song chen-Lu,HAN Gao-rong.INVESTIGATION ON ADHESIVE POWER OF SILICON FILM TO GLASS SUBSTRATE[J].Class,2005,32(2):3-4,21.
Authors:ZHU Jian-qiang  Jiang Ying-na  Song chen-Lu  HAN Gao-rong
Abstract:On different temperature glass substrates silicon film is prepared by APCVD process . SiH4 is used as the starting materials . The adhesive power between silicon film and glass substrate is measured by scratch test . The adhesive power is calculated from the critical load and width of scratch . The change trend of adhesive power with substrate temperature is also investigated . The enhancement of ad sorption . diffusion as well as increment of deposition rate will make film adhere firmlv to its substrate .
Keywords:coated glass  adhesive power  scratch test
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号