Effect of Carbon Precursors on the Microstructure and Bonding State of a Boron–Carbon Compound Grown by LPCVD

Methane (CH₄) and propylene (C₃H₆) were used to fabricate a boron–carbon coating by a low-pressure chemical vapor deposition (LPCVD) technique. The effects of carbon precursors on the phase, microstructure, and bonding state of the deposits have been investigated. X-ray diffraction results show that the 2θ value of the deposit from the C₃H₆ precursor shifts to 25.78° when the coating is deposited at 1223 K, and shifts to 26.1° when deposited at 1273 K, compared with the 2θ value of the pyrocarbon (PyC) peak deposited by LPCVD, which is 25.42°, and no boron–carbon (B–C) compound peak exists. However, the phases of coating deposited from CH₄ include B₂₅C, B₁₃C₂, elemental carbon, and boron. X-ray photoelectron spectroscopy (XPS) results show that the percent contents of boron atom in the coatings from the CH₄ precursor are 61.18% and 67.78% when deposited at 1223 and 1273 K, respectively, much higher than that from the C₃H₆ precursor, 10.85% and 15.30%, respectively. Scanning electron microscopy (SEM) results show that the coatings deposited from CH₄ have a coarse crystal-like morphology; however, the coatings deposited from the C₃H₆ precursor are smooth. The formation of PyC from C₃H₆ is more facile than that from CH₄, which leads to differences in the phase, atom content, and microstructure of coatings from CH₄ and C₃H₆ precursors.