OH-ion distribution profiles in rod preforms of high-silica optical waveguide |
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| Authors: | Kawachi M. Horiguchi M. Kawana A. Miyashita T. |
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| Affiliation: | NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan; |
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| Abstract: | To investigate the OH-contamination mechanism in high-silica optical waveguide, we have measured optically OH-ion distribution profiles in rod preforms prepared by the c.v.d. technique. The contamination due to OH diffusion from the supporting silica tube was clarified in relation to the deposited barrier-glass-layer thickness. |
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