Growth Stresses in the Oxide Scales on TiAl Alloys at 800 and 900°C |
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Authors: | Przybilla W. Schütze M. |
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Affiliation: | (1) Karl-Winnacker-Institut der Dechema, Theodor-Heuss-Allee 25, 60486 Frankfurt am Main, Germany |
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Abstract: | In the oxidation of TiAl alloys, the role of scale-growth stresses formed during oxidation has, thus far, been unknown. In the present paper the oxide-growth stresses were investigated by the deflection-test method in monofacial oxidation (DTMO) accompanied by acoustic-emission measurements. On unmodified surfaces the growth stresses are compressive and reach levels of around –100 MPa. At the same time, significant acoustic emission occurs indicating that even under isothermal conditions, stresses are relieved by a scale-cracking mechanism. For oxide scales on TiAl surfaces, which had been ion implanted with chlorine before oxidation, a very thin protective alumina layer is formed which, however, develops growth stresses in the range of several GPa, accompanied by intensive acoustic emission. In all stress–time curves, a dynamic situation is observed. This consists of phases of stress relief by scale microcracking and phases of stresses increase due to crack healing and further oxide growth. As a result, the level of stress as a function of oxidation time, is characterized by an oscillating course. |
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Keywords: | TiAl oxide scale growth stresses in situ measurements acoustic emission |
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