| AlN陶瓷表面钛金属化反应机理及微观结构 |
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| 引用本文： | 黄奇良,潘伟,张直. AlN陶瓷表面钛金属化反应机理及微观结构[J]. 电子元件与材料, 2003, 22(3): 7-9 |
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| 作者姓名： | 黄奇良 潘伟 张直 |
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| 作者单位： | 1. 广西民族学院化学化工系,广西,南宁,530006
2. 清华大学材料科学与工程系,北京,100084 |
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| 基金项目： | 国家自然科学基金资助项目(59862001)，广西自然科学基金匹配项目(9912014) |
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| 摘 要： | 通过X射线衍射分析和扫描电镜观察研究了利用融盐热歧化反应法在氮化铝陶瓷表面生成的钛金属化复合膜的组成、金属化膜与氮化铝陶瓷基体之间的界面反应及界面层的显微结构。研究发现,钛金属化膜非常均匀致密,膜层与氮化铝陶瓷基体结合紧密,形成了一扩散层,钛与铝组元浓度在该扩散层中呈梯度分布,沉积到AlN陶瓷表面的钛金属与AlN发生反应主要生成TiN0.3、TiAl3和Ti9Al23。
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| 关 键 词： | 界面反应 界面微观结构 金属化 氮化铝 |
| 文章编号： | 1001-2028(2003)03-0007-03 |
| 修稿时间： | 2002-11-05 |
Interfacial Reaction and Microstructure between AlN and Ti Deposited on AlN Ceramic Surface |
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| HUANG Qi-liang,PAN Wei,ZHANG Zhi. Interfacial Reaction and Microstructure between AlN and Ti Deposited on AlN Ceramic Surface[J]. Electronic Components & Materials, 2003, 22(3): 7-9 |
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| Authors: | HUANG Qi-liang PAN Wei ZHANG Zhi |
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| Affiliation: | HUANG Qi-liang1,PAN Wei2,ZHANG Zhi1 |
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| Abstract: | The mechanism of interfacial reaction between AlN and Ti deposited by disproportional reaction method has been determined. The composition of the coating layers and the microstructure of the reaction products were investigated by XRD and SEM. The result show that the metallized film was consisting of TiN0.3, TiAl3 and Ti9Al23. The metallized film is homogenous and firmly bound onto the AIN ceramics surface. |
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| Keywords: | interfacial reaction interfacial microstructure metallization AlN ceramics |
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