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Electrochromic performance of NiVxOy thin films deposited onto flexible PET/ITO substrates by reactive plasma sputtering for flexible electrochromic devices
Authors:Y.-S. Lin  P.-W. Chen  D.-J. Lin
Affiliation:Department of Chemical Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407, Taiwan, ROC
Abstract:An investigation was conducted on the electrochromic properties of plasma sputtered-nickel-vanadium oxide thin films on 40 Ω/□ flexible polyethylene terephthalate/indium tin oxide substrates. Metallic Ni0.93V0.07 target, sputtered by radio frequency power with argon gases and reacted with oxygen gases at room temperature (23 °C), was proven to provide extraordinary electrochromic performance. Cyclic voltammetry switching measurements found that only low driving voltages from − 1 V to 1 V were needed to provide reversible Li+ ion intercalation and deintercalation. The light modulation with up to 52% of transmittance variation, optical density change of 0.446 and color efficiency of 63.8 cm2/C at a wavelength of 550 nm was obtained for 200 cycles of Li+ intercalation and deintercalation in a 1 M LiClO4-propylene carbonate electrolyte.
Keywords:Sputter   Flexible substrate   Electrochromism   Nickel oxide   Vanadium oxide   Cyclic voltammetry
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