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Formation of nanoparticles and nanorods in a N2-C2H4-H2 atmospheric pressure dielectric barrier Townsend discharge |
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| Authors: | Christian Sarra-Bournet,Nicolas Gherardi,Gaé tan Laroche |
| Affiliation: | a Université de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d'Energie), 118 route de Narbonne, F-31602 Toulouse cedex 9, France b CNRS, LAPLACE, F-31602 Toulouse, France c CNRS, PROMES, Tecnosud, F-66100 Perpignan, France d Surface Engineering Laboratory, CERMA, Department of Mining, Metallurgical and Materials Engineering, Université Laval, Quebec, Canada G1V 0A6 |
| Abstract: | In the present publication, the effect of the addition of H2 in an atmospheric pressure Townsend Dielectric Barrier Discharge in an atmosphere of N2-C2H4 is examined with an emphasis put on the evaluation of the surface chemistry and growth mechanisms. Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and Fourier Transform Infrared Spectroscopy were used to characterize the coatings. For all H2 concentrations, films obtained present high N/C ratio (∼ 0.8) with high NHx and nitrile content. However, when H2 is added in the discharge, nanoparticles/nanorods are formed imbedded in a smooth film. The average size of the nanorods is 100-200 nm in diameter with length from 1 to 10 μm. A growth mechanism is proposed to explain the formation of the nanorods on the surface of the coating in the presence of H2. |
| Keywords: | Dielectric barrier discharge Nanorods C2H4 H2 N2 |
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