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Different shape of GaAs quantum structures under various growth conditions
Authors:Jaesu Kim  Kwang-Jae Lee  Cheul-Ro Lee  Mun Seok Jeong  Hoonsoo Kang  Jin Dong Song  Jung Il Lee  Sam Kyu Noh  Jae-Young Leem
Affiliation:a Research Center of Advanced Materials Development (RCAMD), Division of Advanced Materials Engineering, Chonbuk National University, Jeonju 561-756, Republic of Korea
b Advanced Photonics Research Institute, GIST, Gwangju 500-712, Republic of Korea
c Department of Physics, Yeungnam University, Gyeongsan 712-749, Republic of Korea
d Nano device Research Center, KIST, Seoul 130-650, Republic of Korea
e Korea Research Institute of Standards and Science, Daejeon 305-340, Republic of Korea
f Electronics and Telecommunications Research Institute (ETRI), Daejeon 305-350, Republic of Korea
g School of Nano-Engineering, Inje University, Gimhae 621-749, Republic of Korea
Abstract:We report the influences of growth parameters on the characteristics of GaAs quantum rings (QRs) and quantum dots (QDs) formed on AlGaAs/GaAs by the droplet epitaxy (DE) method. After forming Ga droplets on the AlGaAs/GaAs surface, varying amounts of arsenic (As) flux were introduced to fabricate the GaAs quantum structures. By decreasing the As flux from 8 × 10− 5 to 3 × 10− 5 Torr, the shape of the GaAs quantum structures was changed from QDs to elongated QRs. With further decreasing As flux, the shape of the elongated QRs became symmetric. The formation characteristics of the GaAs QRs from the QDs with the amount of As flux were discussed in terms of migration behaviors of the gallium (Ga) atoms on the GaAs(001)-c(4 × 4) surface. The effects of the amount of Ga supply and the growth temperature for the deposition of Ga droplets on the formation of the GaAs quantum structures were also considered.
Keywords:Quantum dot   Quantum ring   Growth conditions
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