Deep level transient spectroscopy on charge traps in high-k ZrO2

The deep trap properties of high-dielectric-constant (k) ZrO₂ thin films were examined by deep level transient spectroscopy (DLTS). The hole traps of a ZrO₂ dielectric deposited by sputtering were investigated in a MOS structure over the temperature range, 375 K-525 K. The potential depth, cross section and concentration of hole traps were estimated to be ∼ 2.5 eV, ∼ 1.8 × 10^− 16 cm² and ∼ 1.0 × 10¹⁶ cm^− 3, respectively. DLTS of ZrO₂ dielectrics can be used to examine the threshold voltage shift (?V_th) during the operation of SONOS-type flash memory devices, which employ high-k materials.