Dissolution kinetics of Si into Ge (111) substrate on the nanoscale |
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Authors: | Zoltá n Balogh,Zoltá n Erdé lyi,Ulf Wiedwald,Anna Tschetschetkin |
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Affiliation: | a Department of Solid State Physics, University of Deberecen, P.O.Box 2, H-4010 Hungaryb Institut für Festkörperphysik, Universität Ulm, D-89069 Ulm, Germany |
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Abstract: | In this paper we present experiments and simulations on the dissolution of Si into single crystalline Ge(111) substrates. The interface shift during the dissolution was tracked by X-ray Photoelectron Spectroscopy. It was obtained that the interface remained sharp and shifted according to anomalous kinetics similarly to our previous measurement in the Si/amorphous-Ge system. The interface shift, x, can be described by a power function of time x ∝ tkc with a kinetic exponent, kc, of 0.85 ± 0.1, larger than the one measured for the amorphous system (0.7 ± 0.1). Both exponents, however, are different from the kc = 0.5 Fickian (parabolic) value and it is interpreted as a nanoscale diffusional anomaly caused by the strong composition dependence of the diffusion coefficients. |
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Keywords: | Photoelectron spectroscopy Anomalous diffusion Semiconductor |
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