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Structural and electrochromic properties of TiO2 thin films prepared by metallorganic chemical vapor deposition |
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| Authors: | ZS Khalifa H Lin |
| Affiliation: | a Department of Physics, Beni-Suef University, Beni-Suef 62111, Egypt b Department of Materials Science and Engineering, University of Delaware, Newark, 19716, USA c Department of Physics and Astronomy, University of Delaware, Newark, 19716, USA |
| Abstract: | Titanium dioxide thin films were deposited by Metallorganic Chemical Vapor Deposition at substrate temperatures ranging from 250 °C to 450 °C over soda lime glass and indium tin oxide coated glass substrates. X-ray diffraction studies show that films have a crystalline anatase structure at all the deposition temperatures. Particle size decreases and texture changes with the increase in substrate temperature. X-ray photoelectron spectroscopy confirms the appearance of a new well resolved state in the core level of Ti 2p spectrum shifted by 1.16 eV to lower binding energy due to the reduction of Ti+ 4 to Ti+ 3 upon litheation. Chronoamperometery, cyclic voltammetery and in situ UV-Vis spectrophotometeric studies were carried out on the prepared samples. Particle size and crystallinity control the electrochromic performance. The 350 °C film shows the highest ion storage capacity and the highest optical modulation along with an appreciable band gap broadening. |
| Keywords: | Metallorganic Chemical Vapor Deposition Photochromic property Thin films Titanium dioxide Voltammetry X-ray diffraction |
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