Microwave irradiation-assisted method for the deposition of adherent oxide films on semiconducting and dielectric substrates |
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Authors: | Sanjaya Brahma SA Shivashankar |
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Affiliation: | Materials Research Centre, Indian Institute of Science, Bangalore 560012, India Center for Excellence in Nanoelectronics, Indian Institute of Science, Bangalore-560012, India |
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Abstract: | We report a method for the deposition of thin films and thick coatings of metal oxides through the liquid medium, involving the microwave irradiation of a solution of a metal-organic complex in a suitable dielectric solvent. The process is a combination of sol-gel and dip-coating methods, wherein coatings can be obtained on nonconducting and semiconducting substrates, within a few minutes. Thin films of nanostructured ZnO (würtzite) have been obtained on Si(100), glass and polymer substrates, the nanostructure determined by process parameters. The coatings are strongly adherent and uniform over 15 mm × 15 mm, the growth rate ∼ 0.25 μm/min. Coatings of nanocrystalline Fe2O3 and Ga2O3 have also been obtained. The method is scalable to larger substrates, and is promising as a low temperature technique for coating dielectric substrates, including flexible polymers. |
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Keywords: | Nanostructures Thin films Coatings Oxides X-ray diffraction Electron microscopy Microwave irradiation Deposition from solutions |
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