Homoepitaxial MgxZn1 − xO (0 ≤ x ≤ 0.22) thin films grown by pulsed laser deposition |
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Authors: | Michael Lorenz Matthias Brandt Gabriele Benndorf Detlef Klimm |
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Affiliation: | a Universität Leipzig, Institut für Experimentelle Physik II, Semiconductor Physics Group, Linnéstr. 5, D-04103 Leipzig, Germany b Leibniz-Institut für Kristallzüchtung, Max-Born-Str. 2, D-12489 Berlin, Germany |
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Abstract: | Homoepitaxial MgZnO thin films were grown from PLD targets with 1, 2, 4, and 10 wt.% MgO content on ZnO-buffered ZnO(001) substrates. The resulting Mg content of the films was determined from the blue-shift of the excitonic peak in low-temperature photoluminescence spectra. With increasing Mg content a considerable increase of film mosaicity was observed from HR-XRD (002) rocking curves. Triple-axis reciprocal space maps of symmetric (002) and asymmetric (104) reflections show the structural development in terms of tilt and perpendicular and parallel strain. For more than 1% Mg the films exhibit increasing tensile out-of-plane strain. Very high electron mobilities of 200 cm²/Vs at 300 K and 900 cm²/Vs at 65 K were measured in the homoepitaxial MgZnO/ZnO thin films with free electron concentrations around 1018 and 1017 cm− 3, respectively. The homoepitaxial ZnO template film deposited from a melt-grown ZnO single crystal as PLD target shows two orders of magnitude lower carrier concentration due to high compensation. |
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Keywords: | MgZnO thin films Homoepitaxy Pulsed laser deposition Photoluminescence High-resolution X-ray diffraction Hall effect |
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