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Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering |
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| Authors: | Yu-Wei Lin Jia-Hong Huang |
| Affiliation: | a Instrument Technology Research Center, 20 R&D Road VI, Hsinchu Science-Based Industrial Park, Hsinchu 300, Taiwan, ROC b Department of Engineering and System Science National Tsing Hua University,101 Kuang Fu Rd., Sec. 2, Hsinchu 300, Taiwan, ROC c Institute of Nuclear Engineering and Science National Tsing Hua University,101 Kuang Fu Rd., Sec. 2, Hsinchu 300, Taiwan, ROC |
| Abstract: | The effect of nitrogen flow rate on structure and properties of (Ti,Zr)N thin films was investigated in the study. Two types of (Ti,Zr)N thin films were found with different nitrogen flow rates, one is the single-phase solid solution of (Ti,Zr)N that appeared for nitrogen flow rates of 2-7 sccm, the other one is the phase of both (Ti,Zr)N and TiZr mixture for the lower nitrogen flow rates of 1 sccm. The grain size of the films was also determined by X-ray diffraction, and the size was less than 20 nm. The (Ti,Zr)N films show excellent hardness ranging from 35.5 to 37.5 GPa with exhibiting (111) preferred orientation. |
| Keywords: | (Ti,Zr)N Nitrogen flow rate Magnetron sputtering |
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