Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering |
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| Authors: | M.C. Liao G.S. Chen |
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| Affiliation: | a Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan
b Nuclear Science and Technology Development Center, National Tsing Hua University, Hsinchu 30013, Taiwan |
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| Abstract: | A series of TiO2 thin films was deposited onto glass substrates without intentional heating or biasing by magnetron sputtering of a titanium target using Ar/O2 reactive mixtures over a broad range of total sputtering pressures from 0.12 Pa to 2.24 Pa. Each of the film types was deposited by the threshold poisoned mode at a specific given oxygen flow rate monitored in-situ by optical emission spectroscopy. Both the sputtering pressure and thermal annealing are the key factors for the TiO2 films to yield fast-response superhydrophilicity with a water contact angle of 5°. The mechanism of superhydrophilicity for the TiO2 films deposited by high-pressure sputtering will be discussed based on empirical studies of X-ray diffractometry, high-resolution scanning microscopy and atomic force spectroscopy. |
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| Keywords: | TiO2 thin films High-pressure sputtering Hydrophilicity Optical emission spectroscopy |
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