A study of atomic layer deposited LiAlxOy films on Mg-Li alloys |
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| Authors: | PC Wang MC Lin MJ Chen |
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| Affiliation: | a Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan
b Department of Materials Science and Engineering, Feng Chia University, Taichung, Taiwan |
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| Abstract: | LiAlxOy films with thicknesses of 65-200 nm were deposited by the atomic layer deposition (ALD) technique on the LZ101 Mg-Li alloy. The ALD-deposited LiAlxOy films exhibit an amorphous structure and have an atomic ratios of Li:Al:O = 1:1:2. The potentio-dynamic polarization tests show that the corrosion resistance of Mg-Li alloys can be significantly improved due to the dense and pinhole-free structure as well as the excellent coverage and conformity of the ALD-deposited LiAlxOy films. |
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| Keywords: | Atomic layer deposition LiAlxOy film Mg-Li alloy Corrosion resistance |
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