Structural and discharging properties of MgO thin films prepared by pulsed laser deposition |
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Authors: | M. Kodu J. Raud T. Avarmaa J.-S. Choi R. Jaaniso M.-S. Lee Y.T. Matulevich V. Sammelselg |
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Affiliation: | a Institute of Physics, University of Tartu, Riia 142, 51 014 Tartu, Estoniab PDP Development Team, Samsung SDI, 508, Sungsung-dong, Cheonan-si, Chungcheongnam-do 330-300, Republic of Koreac Energy Lab, Corporate R&D Centre, Samsung SDI, 428-5, Gongse-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-577, Republic of Korea |
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Abstract: | In this work, pulsed laser-deposited thin films of MgO were studied for application in plasma display panels. The firing voltage (FV) of discharge cells with MgO films was measured and the film structure was investigated as a function of film deposition conditions. MgO thin films were deposited at oxygen pressure and substrate temperature between 0.02-5 Pa and 260-600 °C, respectively. The structure of thin films was investigated by using X-ray diffraction, X-ray reflection and atomic force microscopy methods. It was found that the FV is strongly correlated with the film deposition conditions and structural properties. In general, the FV values were smaller for the films with higher crystallinity and density. The crystallinity and the density of the films increased when the deposition temperature was raised and the O2 pressure was reduced. The lowest FV values (~ 120 V) were obtained at the growth temperature of 550 °C and at O2 pressures below 1 Pa. |
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Keywords: | Magnesium Oxides Laser ablation Electronic devices Surface roughness Plasma display panels |
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