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Pd/V_2O_5薄膜的氢气敏感性质研究
引用本文:余海湖,史勇,吴银伟,黄金山. Pd/V_2O_5薄膜的氢气敏感性质研究[J]. 武汉理工大学学报, 2010, 0(11)
作者姓名:余海湖  史勇  吴银伟  黄金山
作者单位:武汉理工大学材料复合新技术国家重点实验室;武汉理工大学光纤传感技术与信息处理教育部重点实验室;
基金项目:国家自然科学基金重点项目(60537050)
摘    要:采用磁控溅射法制备了不同厚度的Pd/V2O5双层复合薄膜,采用紫外-可见光分光光度计研究了薄膜的氢气敏感性质,原位测量了薄膜的激光拉曼光谱并分析了薄膜的氢气敏感机理。结果表明,复合薄膜V2O5(280 nm)/Pd(30nm)对氢气的敏感性质较好,对0.01%H2-N2有响应,在4%H2-N2标气中,在560 nm处透过率的相对变化值达到25%。拉曼光谱分析结果表明,Pd/V2O5薄膜在与氢气作用过程中,Pd膜主要起催化作用,氢原子扩散到V2O5层,V5+转变为V4+,导致Pd/V2O5薄膜的透过率发生变化。

关 键 词:Pd/V2O5薄膜  磁控溅射  氢敏性质  气致变色机理  

Research on Hydrogen Sensing Properties of Pd/V_2O_5 Thin Films
YU Hai-hu,SHI Yong,WU Yin-wei,HUANG Jinshan. Research on Hydrogen Sensing Properties of Pd/V_2O_5 Thin Films[J]. Journal of Wuhan University of Technology, 2010, 0(11)
Authors:YU Hai-hu  SHI Yong  WU Yin-wei  HUANG Jinshan
Affiliation:YU Hai-hu1,SHI Yong2,WU Yin-wei2,HUANG Jinshan2(1.State Key Laboratory of Advanced Technology for Materials Synthesis Processing,Wuhan University of Technology,Wuhan 430070,China,2.Key Laboratory of Fiber Optical Sensing Technology and Information Processing of Ministry Education,China)
Abstract:Pd/V2O5 double-layer films with different thickness were deposited with magnetron sputtering method.The hydrogen-sensing properties and the gasochromic mechanism of the composite films were investigated with a UV-Vis spectrophotometer and a Raman spectroscope,respectively.The results show that,thin film V2O5(280 nm)/Pd(30 nm) possesses relatively good sensing properties to hydrogen gas.This thin film is sensitive to 0.01% H2-N2,and a change of 25% in relative transmitance at 560 nm can be observed in 4% H2-...
Keywords:Pd/V2O5 thin film  magnetron sputtering  hydrogen-sensing properties  gasochromic mechanism  
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