RIBLL大面积真空镀膜装置

描述了一台大面积双叠层阳极在 X、Y方向分条读出气体电离室而发展的大面积真空镀膜装置。镀膜腔体内体积为 990 mm× 780 mm× 780 mm。可镀膜面积最大为 960 mm× 750 mm。用该装置为RIBLL电离室镀阴极、X阳极、Y阳极和窗 ,镀膜面积 4 4 0 mm× 160 mm,Mylar膜厚 3.2 6μm,镀银 97.2 7nm,镀银厚度不均匀度为 18.91%。用它制作的 RIBLL电离室的阳极、阴极 ,当电离室工作气压2 5k Pa P10气体 ,阳极电压 2 2 0 V,阴极电压 - 160 0 V时 ,对 5.15Me Vα源测量能量分辨率为 4 .2 %。

A large area Mylar foil vacuum-silver-plated equipment of RIBLL

A large area vacuum-silver-plated equipment is described. It wassteup in constructing two-fold ionizing chamber with anodes tripped readout of RIBLL. The dimension of vacuum chamber is 990mm×780mm ×780mm. The maximun area of Mylar foil plated is about 960mm×750mm. The cathode, anodes- tipped and windows of two-fold IC had been plated with Ag in this equipment, The area of Mylar foils are 440mm×160mm. Thickness of Mylar is 3.26μm and thickness of Ag-plated is 97.27nm in average. The relative dispersion of thickness in the siver-plated is 18.91％. The IC with cathode and anodes-tripped Ag-plated of RIBLL was measured. When the pressure of P10 operating gas is 25kPa ,the cathode is set at －1600V and the anodes are at 200V, the energy resolution 4.2％ for 5. 15MeV α particle is obtained.