| Abstract: | A deposition & implantation system, which includes three filtered vacuum arc plasma sources, has been built. Vacuum arc discharge is used to produce high-density metal plasma; Curved magnetic filtering technique is used to transfer the plasma into out-of-sight vacuum chamber and reduce macro-particles from the vacuum arc plasma in order to drastically reduce the macro-particles contamination of the films. The up to 30 kV negative bias applied to the target can be used for ion implantation in order to improve the film adhesion; or for ion sputtering to clear the substrate surface. The 0 to 300 V negative bias can be used to adjust the ion energy which forming films. The system is designed for various thin films synthesizing, such as single-layer, compound layer, multi-layer films. It's principle, components and applications are described in the literature. |
