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Studies of 2-hydroxyethyl methacrylate and ethyl acrylate copolymers as negative photoresists |
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| Authors: | I. K. Varma S. Patnaik |
| Abstract: | The potential of 2-hydroxyethyl methacrylate and ethyl acrylate copolymers as negative photoresists was studied. Negative photoresist solution was prepared by esterfication of copolymers with cinnamoyl chloride. The effects of photosensitizer concentration, copolymer composition, and exposure time were investigated. A resolution of 30 μm was attained from these photoresists. |
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