| 电磁复合场三级几何像差方程的修正与像差系数 |
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| 引用本文： | 杨立才,张玉林.电磁复合场三级几何像差方程的修正与像差系数[J].微细加工技术,1996(1):7-16. |
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| 作者姓名： | 杨立才 张玉林 |
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| 作者单位： | 山东工业大学自动化系 |
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| 摘 要： | 本文基于作者提出的“函数逼近的数值迭代概念”，修正了电磁复合场中电子成像系统的三级几何像差方程式，给出了具有更高精度的像差计算公式和用集中参数形式描述的像差系数表达式，为像差的数值计算和电子光学系统的计算机优化设计提供了实用的理论依据。
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| 关 键 词： | 电子光学 像差 电磁复合场 三级几何像差 |
CORRECTION OF THIRD-ORDER GEOMETRICAL ABERRATION EQUATION IN COMBINED FIELDS AND ABERRATION COEFFICIENTS |
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| Yang Lieai, Zhang Yulin, Chen Zhensheng.CORRECTION OF THIRD-ORDER GEOMETRICAL ABERRATION EQUATION IN COMBINED FIELDS AND ABERRATION COEFFICIENTS[J].Microfabrication Technology,1996(1):7-16. |
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| Authors: | Yang Lieai Zhang Yulin Chen Zhensheng |
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| Abstract: | The corretion of third-order geometrical aberration equation in combined fields is made, based on the concept of function approaching and numerical iteration reported by author in another paper. The calculating formula for aberrations with higher precision and expression for aberration coefficients described by lumped parameters are given. The conclusions given in this paper provide a practical theoritical basis for numerical calculation of aberrations and computer-aided optimum design of electron optics system. |
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| Keywords: | electron optics aberration electron beam lithography electron microscope |
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