| 曝光均匀照明系统光照均匀性研究 |
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| 引用本文： | 周崇喜,林大键.曝光均匀照明系统光照均匀性研究[J].微细加工技术,1996(1):23-28. |
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| 作者姓名： | 周崇喜 林大键 |
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| 作者单位： | 中国科学院光电技术研究所微细加工光学技术实验室 |
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| 摘 要： | 本文叙述了曝光照明系统的均匀照明原理及实现方法，并提出用计算模拟的方法研究曝光系统的光照分布情况，编制了相应的计算模拟程序。作为实例，给出了作者设计的两个典型的曝光系统光照分布的计算模拟结果。
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| 关 键 词： | 曝光系统 光照分布 计算模拟 |
RESEARCH OF INTENSITY DISTRIBUTION OF UNIFORM ILLUMINATION SYSTEM FOR OPTICAL PHOTOLITHOGRAPHY |
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| Zhou Chongxi, Lin Dajian,Li Zhan.RESEARCH OF INTENSITY DISTRIBUTION OF UNIFORM ILLUMINATION SYSTEM FOR OPTICAL PHOTOLITHOGRAPHY[J].Microfabrication Technology,1996(1):23-28. |
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| Authors: | Zhou Chongxi Lin Dajian Li Zhan |
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| Abstract: | The principle of uniform illumination of the illumination system for optical photolithography and it' S practice method are described. The study of the intensity distribution of the illumination systems by the calculating simulation is provided. As examples, the calculating simulation results of two typical systems designed by authors recently are given. |
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| Keywords: | exposure system distribution of illumination intensity calculating simulation |
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