| 非晶壳层SixN/SiyC包覆硅量子点的微结构表征 |
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| 引用本文： | 畅庚榕,马飞,马大衍,徐可为. 非晶壳层SixN/SiyC包覆硅量子点的微结构表征[J]. 纳米科技, 2010, 0(5): 70-75 |
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| 作者姓名： | 畅庚榕 马飞 马大衍 徐可为 |
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| 作者单位： | 西安交通大学金属材料强度国家重点实验室,陕西西安710049 |
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| 基金项目： | Acknowledgements This work was supported by Key Project of Chinese National Programs for Fundamental Research and Development（Grant No. 2010CB631002）, National Natural Science Foundation of China （Grant No. 50771078, 50901057） and Xi＇ an Applied Materials Innovation Fund （XA-AM- 200904） . The authors thank Guo S W and Li Y H for their help with the HRTEM operation. |
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| 摘 要： | 通过磁控溅射技术和1100℃的高温后退火处理,在富硅碳化硅薄膜中形成高密度小尺寸的硅量子点,硅量子点的结构由X射线光电子能谱和高分辨透射电镜进行表征,结果表明,在高温退火过程中,碳化硅薄膜发生了相分离,硅和碳的化学结合态在热力学的驱动下形成稳定的Si-Si键和Si-C键,同时,氮原子钝化了分解过程中形成的Si悬挂键,在硅量子点的表面形成SixN/SiyC非晶壳层。这种非晶壳层包覆量子点的结构配置非常有利于形成稳定的超小硅量子点 （1-3 nm）,此结构的量子效应所产生的光吸收了从绿光到紫外光的光谱范围,大幅度提高光伏太阳能电池的光电转换效率。
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| 关 键 词： | 硅量子点 碳化硅薄膜 X射线光电子能谱 |
Microstructure Characterization of Silicon Quantum Dots Surrounded by SixN/SiyC Amorphous Shell |
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| CHANG Geng-rong,MA Fei,MA Da-yan,XU Ke-wei. Microstructure Characterization of Silicon Quantum Dots Surrounded by SixN/SiyC Amorphous Shell[J]. , 2010, 0(5): 70-75 |
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| Authors: | CHANG Geng-rong MA Fei MA Da-yan XU Ke-wei |
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| Affiliation: | (State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049, China) |
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| Abstract: | Silicon quantum dots （Si QDs） embedded in Si-rich silicon carbide films were realized by magnetron co -sputtering process and post annealing in nitrogen atmosphere at 1100℃ and characterized by X -ray photoelectron spectroscopy and high resolution transmission electron microscopy. The results reveal that, Si and C bonding states undergo modulation and become inhomogeneous during thermal annealing. As a result, Si QDs were encapsulated by SixN/SiyC amorphous shell due to passivation of N atoms, which leads to ultrasmall Si QDs and green-ultraviolet luminescent. Tailoring shell composition and microstructure of Si QDs would be extremely advantageous to improve the optoelectronic properties. |
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| Keywords: | Si quantum dots silicon carbide films X-ray photoelectron spectroscopy |
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