Phase Evolution of Ti3SiC2 Annealing in Vacuum at Elevated Temperatures |
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Authors: | Junling Zeng Shufang Ren Jinjun Lu |
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Affiliation: | 1. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, , Lanzhou, 730000 PRC, China;2. Graduate School of Chinese Academy of Sciences, , Beijing, 100039 PRC, China |
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Abstract: | The thermal decomposition of Ti3SiC2 in vacuum furnace up to 1500°C has been investigated. The results show that the mild decomposition of Ti3SiC2 commences at 1300°C and the higher the holding temperature, the larger the volatilization of Si atoms. The Ti3SiC2 decomposition occurs simultaneously on the surface and in the bulk. Four phases coexist at 1400°C and 1450°C and the Ti5Si3Cx phase appears in the bulk and/or surface. Diffusion distance, rate, and volatilization of Si contribute to the porous structure and the presence of Ti5Si3Cx. The evolution of furnace pressure reflects the decomposition kinetics of Ti3SiC2. |
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