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| 钢基渗铝过渡层上沉积金刚石薄膜的研究 | |
| 引用本文： | 王传新,汪建华,马志斌,满卫东,王升高,康志成. 钢基渗铝过渡层上沉积金刚石薄膜的研究[J]. 金属热处理, 2003, 28(9): 4-7 |
| 作者姓名： | 王传新 汪建华 马志斌 满卫东 王升高 康志成 |
| 作者单位： | 1. 中国科学院,等离子体物理研究所,安徽,合肥,230031;武汉化工学院,湖北省微波等离子体化学与新材料重点实验室,湖北,武汉,430073 2. 武汉化工学院,湖北省微波等离子体化学与新材料重点实验室,湖北,武汉,430073 3. 中国科学院,等离子体物理研究所,安徽,合肥,230031 |
| 摘 要： | 在微波等离子体化学气相沉积(MPCVD)装置中,以45钢钢板上的渗铝层作为过渡层,制备金刚石薄膜。研究了基体表面不同的铝含量对金刚石膜质量的影响。扫描电子显微镜(SEM)、能谱和Raman谱测试表明,渗铝层中的FeAl等金属间化合物在低温沉积时能减弱碳向基体的扩散,防止非金刚石相碳的出现,从而有利于高质量的金刚石薄膜的沉积。而试样表面过低的铝含量及过高的沉积温度不利于金刚石薄膜的形核与生长。 |
| 关 键 词： | 金刚石薄膜 化学气相沉积 渗铝 过渡层 |
| 文章编号： | 0254-6051(2003)09-0004-04 |
| 修稿时间： | 2003-03-24 |
Diamond Film Deposition on Aluminized Transition Layer of Steel Substrates |
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| WANG Chuan xin ,,WANG Jian hua ,MA Zhi bin ,MAN Wei dong ,,WANG Sheng gao ,,KANG Zhi cheng. Diamond Film Deposition on Aluminized Transition Layer of Steel Substrates[J]. Heat Treatment of Metals, 2003, 28(9): 4-7 | |
| Authors: | WANG Chuan xin WANG Jian hua MA Zhi bin MAN Wei dong WANG Sheng gao KANG Zhi cheng |
| Affiliation: | WANG Chuan xin 1,2,WANG Jian hua 2,MA Zhi bin 2,MAN Wei dong 1,2,WANG Sheng gao 1,2,KANG Zhi cheng 1 |
| Abstract: | Diamond films were deposited on 45 steel surface using aluminized transition layer by a microwave plasma chemical vapor deposition(MPCVD) equipment.The effects of Al content in the aluminized layer on the quality of diamond films were investigated.SEM,energy dispersive X ray analyzer (EDAX) and Raman analyses spectra show that intermetallic compounds such as FeAl formed in the aluminized layer,can restrain the diffusion of carbon into the bulk substrate and prevent the formation of non diamond phase when the substrate temperature is low,and hence help to deposite with high quality.The results also suggest that too low aluminum concentration on the substrate surface or too high deposition temperature are detrimental to diamond nucleation and growth. |
| Keywords: | diamond films chemical vapor deposition(CVD) aluminizing transition layer |
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