钕在氟氧化物和氧化物玻璃中的光谱分析

采用熔融法分别制备出掺钕氟氧化物玻璃和锂铝硅氧化物玻璃。采用UV-vis-NIR分光光度计和荧光光谱仪测定两种玻璃基质材料的透过率、吸收光谱和荧光光谱。紫外光区透过率的细微差异是氧化物和氟化物电子构型不同造成的。可见光和红外光区透过率差异是阳离子半径不同和基质材料密度不均匀引起的。主要吸收峰位于523、582、744、802、870nm处,分别对应于钕离子的4I9/2→4G7/2、4I9/2→2H11/2、4I9/2→4F7/2、4I9/2→4F5/2和4I9/2→4F13/2吸收跃迁。位于892、1057、1107、1333nm处的荧光发射中心,分别对应于钕离子的4F3/2→4I9/2、4F3/2→4I11/2和4F3/2→4I13/2辐射跃迁。氟氧化物玻璃在892、1107、1333nm处的荧光光谱强度明显高于氧化物玻璃,两者在1057nm处的发光强度基本一致。由于钕离子进入低声子能量的氟化物中,无辐射跃迁损失小,氟氧化物玻璃基质的量子效率高于氧化物玻璃基质的量子效率。

Optical spectra analysis of Nd3+ in oxy-fluoride and oxide glass systems

Nd3+-doped oxy-fluoride and lithium aluminosilicate glasses were prepared by the melting method. The glass samples were characterized by UV-vis-NIR spectrophotometer and fluorescence spectrometer. The research focused on the optical trans-mittance, absorption and fluorescence spectra of Nd3+ in the two glass media. The transmittance difference in ultraviolet wave-length is contributed to the electron configuration difference of fluoride and oxide. The transmittance discrepancy in visible and infrared wavelength is contributed to the different radii of cations and scatter loss of fluoride particles. The main absorption peaks centering at 523, 582, 744, 802, 870 nm are corresponding to the Nd3+ ions absorption transitions of 4I9/2→4G7/2, 4I9/2→2H11/2, 4I9/2→4F7/2, 4I9/2→4F5/2, 4I9/2→4F13/2, the main absorption peak locates at 582 nm. The main emission peaks centering at 892, 105 7, 110 7 and 1 333 nm are contributed to the Nd3+ ions radiation transitions of 4F3/2→4I9/2, 4F3/2→4I11/2, 4F3/2→4I13/2. The fluorescence intensity of the oxy-fluoride glass is stronger than that of the oxide glass at 892, 1 107 and 1 333 nm, and nearly reaches the same value at 1 057 nm. Nd3+ enters into fluoride with the low phonon energy, so the loss of irradiation transitions deduces, the quantum efficiency of oxy-fluoride glass is higher than that of oxide glass.