Formation of a Buffer Layer for Graphene on C-Face SiC{0001}

Graphene films prepared by heating the SiC $ (000\bar{1}) $ surface (the C-face of the {0001} surface) in a Si-rich environment have been studied using low-energy electron diffraction (LEED) and low-energy electron microscopy. Upon graphitization, an interface with $ \sqrt {43} \times \sqrt {43} - R \pm 7.6^\circ $ symmetry is observed by in situ LEED. After oxidation, the interface displays $ \sqrt 3 \times \sqrt 3 - R 30^\circ $ symmetry. Electron reflectivity measurements indicate that these interface structures arise from a graphene-like “buffer layer” that forms between the graphene and the SiC, similar to that observed on Si-face SiC. From a dynamical LEED structure calculation for the oxidized C-face surface, it is found to consist of a graphene layer sitting on top of a silicate (Si₂O₃) layer, with the silicate layer having the well-known structure as previously studied on bare SiC $ (000\bar{1}) $ surfaces. Based on this result, the structure of the interface prior to oxidation is discussed.