MEMS显微干涉测量系统中相移器性能的研究

显微干涉测量方法是一种被广泛使用的高精度表面测量方法,其中相移器的性能直接影响到系统测量的精度.对MEMS测量系统中使用的压电陶瓷相移器的主要误差源,包括迟滞、非线性和蠕变等进行了分析,并对开环条件下的相移器运动进行了标定.实验分别在开环和闭环条件下测量了经过NIST认证的标准44 nm台阶,说明了两种条件下的测量精度,10次测量的平均值分别为41.34 m和43.24 nm,标准偏差分别为2.08 nm和0.41 nm.

Study on the Performance of Phase-shifter in the MEMS Microscopic Interferometric Measuring System

Microscopic interferometry is a popular measurement method used in high accuracy surface characterization, where the phase shifter performance plays an important role in the accuracy of the system. The main error sources of the PZT phase shifter including hysteresis, nonlinearity and creep are analyzed. The open loop phase shifter is calibrated. Experiments are done on the 44nm step standard which is calibrated by NIST in the open loop and close loop. These show the measurement accuracy in these two conditions. Mean values of 10 measurements are 41.34 nm and 43.24 nm respectively, the standard deviation values are 2.08 nm and 0.41 nm respectively.