Bonding defects and optical band gaps of DLC films deposited by microwave surface-wave plasma CVD |
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Authors: | Sunil Adhikary Xue M. Tian Sudip Adhikari Ashraf M.M. Omer Hideo Uchida Masayoshi Umeno |
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Affiliation: | aDepartment of Electronics and Information Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan;bDepartment of Electrical and Electronic Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan |
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Abstract: | The effects of CH4 / C2H4 flow ratio and annealing temperature on the defect states and optical properties of diamond-like carbon (DLC) films deposited by novel microwave surface-wave plasma chemical vapour deposition (MW SWP CVD) are studied through UV/VIS/NIR measurements, atomic force microscopy, Raman spectroscopy and electron spin resonance analysis. The optical band gap of DLC has been tailored between a relatively narrow range, 2.65–2.5 eV by manipulating CH4 / C2H4 flow ratio and a wide range, 2.5–0.95 by thermal annealing. The ESR spin density varied between 1019 to 1017 spins/cm3 depending on the CH4 / C2H4 flow ratio (1 : 3 to 3 : 1). The defect density increased with increasing annealing temperature. Also, there is a strong dependence of spin density on the optical band gap of the annealed-DLC films, and this dependency has been qualitatively understood from Raman spectra of the films as a result of structural changes due to sp3/sp2 carbon bonding network. The surfaces of the films are found to be very smooth and uniform (RMS roughness < 0.5 nm). |
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Keywords: | DLC films Microwave surface-wave plasma CVD Defect density Optical band gap |
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