| 光学和电子束曝光系统之间的匹配与混合光刻技术 |
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| 引用本文： | 陈宝钦,刘明,徐秋霞,薛丽君,李金儒,汤跃科,赵珉,刘珠明,王德强,任黎明,胡勇,龙世兵,陆晶,杨清华,张立辉,牛洁斌.光学和电子束曝光系统之间的匹配与混合光刻技术[J].半导体学报,2006,27(13):1-6. |
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| 作者姓名： | 陈宝钦 刘明 徐秋霞 薛丽君 李金儒 汤跃科 赵珉 刘珠明 王德强 任黎明 胡勇 龙世兵 陆晶 杨清华 张立辉 牛洁斌 |
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| 作者单位： | 中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029;中国科学院微电子研究所 微细加工与纳米技术研究室，北京 100029 |
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| 摘 要： | 介绍如何实现光学和电子束曝光系统之间的匹配和混合光刻的技术，包括：(1）光学曝光系统与电子束曝光系统的匹配技术；(2）投影光刻和JBX-5000LS混合曝光技术；(3）接触式光刻机和JBX-5000LS混合曝光技术；(4）大小束流混合曝光技术或大小光阑混合曝光技术；(5）电子束与光学曝光系统混合光刻对准标记制作技术. 该技术已成功地应用于纳米器件和集成电路的研制工作，实现了20nm线条曝光，研制成功了27nm CMOS器件；进行了50nm单电子器件的演试；并广泛地用于100nm化合物器件和其他微/纳米结构的制造.
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| 关 键 词： | 微光刻技术 微纳米加工技术 电子束直写 匹配与混合光刻技术 |
Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System |
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| Chen Baoqin,Liu Ming,Xu Qiuxi,Xue Lijun,Li Jinru,Tang Yueke,Zhao Min,Liu Zhuming,Wang Deqiang,Ren Liming,Hu Yong,Long Shibing,Lu Jing,Yang Qinghu,Zhang Lihui and Niu Jiebin.Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System[J].Chinese Journal of Semiconductors,2006,27(13):1-6. |
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| Authors: | Chen Baoqin Liu Ming Xu Qiuxi Xue Lijun Li Jinru Tang Yueke Zhao Min Liu Zhuming Wang Deqiang Ren Liming Hu Yong Long Shibing Lu Jing Yang Qinghu Zhang Lihui and Niu Jiebin |
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| Affiliation: | Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China;Micro-Processing & Nano-Technology Laboratory,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029, China |
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| Abstract: | This paper described the match & mixed lithography technology between E-beam lithography system and optical lithography system.The following contents are illustrated in detail:(1) Match & mixed lithography technology between E-beam and optical system; (2) Match & mixed lithography technology between stepper and JBX-5000 lithography system; (3) Match & mixed lithography technology between contact printers and JBX-5000LS; (4) Big/small electrical beam current or big/small aperture diaphragm mixed lithography technology; (5) Alignment mark making method in match & mixed lithography technology.The technologies mentioned above have extensively been applied in the fields of micro- and nano- manufacture.As the results,we realized the 20nm line,27nm gate CMOS transistor,50nm island SET,100nm gate HEMT and other nanometer level devices. |
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| Keywords: | micro-lithography micro-nanofabrication EBDW match & mixed lithography technology |
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